Radical Polymers

- Model 205 - Enhanced Polymaleic Acid (EMPA)


INITIA 205 is an exceptional additive for the control of calcium phosphate in water treatment applications such as cooling. INITIA 205 has been evaluated versus industry leading sulfonated ter-polymers and tetra-polymers and has demonstrated superior performance under a wide-range of conditions. The graphs below summarize the performance of INITIA 205 under stressed conditions at 5, 10, and 15 mg/l ortho-phosphate.

INITIA 205 delivers…

  • best-in-class calcium phosphate stabilization
  • exceptional iron stabilization
  • highly effective particulate and solids dispersion

suggested applications

  • cooling towers
  • boilers (<400psi)
  • reverse osmosis
  • mining
  • oilfield and natural gas
Iron stabilization

INITIA 205 is an exceptional additive for the stabilization of iron and other transition metals. To demonstrate the efficacy of INITIA 205 experiments were conducted using 2 mg/l of ferrous iron that was oxidized and precipitated at a pH of 8.8-9.0. The images below show filtered iron collected on a 0.2μm membrane and subsequent image analysis. The data show INITIA 205 to be highly effective at stabilizing colloidal iron.

Product neutralization
INITIA 205 is supplied as a concentrated (~45%) sulfonated copolymer at a pH of 2.5-4.0. The neutralization INITIA 205 is exothermic and can produce a rapid increase in heat during formulation. INITIA 205 should be diluted to the desired final formulation concentration with deionized water prior to adding a neutralizing agent. Neutralizing agents should be added slowly until the desired pH is achieved. Effective neutralization is possible without observing product precipitation using either NaOH or KOH. The graphs below indicate the approximate amount of NaOH or KOH required to neutralize INITIA 205 to a given final pH.

appearance  slightly hazy, pale straw liquid
solids content  44-46%
pH (as is)  2.5-4.0
viscosity at  25° C  <500 cPs
density at 20° C  1.17 + 0.05 g/ml
solubility in water  complete
residual monomer  <0.1%

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