SAM - Planar Sputtering Target

Manufacturing Methods of Planar Target

Stanford Advanced Materials provides the custom-made planar sputtering targets, mainly Cr, Ag, Al, Si, Sn, Ti, Stainless steel, TiO2, W, Ta, Mo, Nb, Cu and other metal and alloy materials.

Cast: Our product includes Mo, In alloys, Cu, Si, Ti alloys and other materials. Targets can be cast directly to a backing plate or bonded. SAM provides material-specific re-casting service.

HIP/Hot-pressed/Sintered: SAM offers a range of targets made using powder-metallurgical and ceramic processing methods. These include, but are not limited to, ATO, AZO, Cr, ITO etc.

Rolled/Forged/Brazed: SAM provides custom engineering and unique thermo-mechanical process solutions (e.g., grain-size control) for various materials, including Ag, Nb, NiCr, Ta and Zr.